采用热壁化学气相沉积工艺在Si(111)衬底上生长GaN晶体膜,并对其生长条件进行研究.用X射线衍射(XRD)、扫描电镜(SEM)、荧光光谱(PL)对样品进行结构、形貌和发光特性的分析.测试结果表明:用此方法得到了六方纤锌矿结构的GaN晶体膜.实验结果显示:采用该工艺制备GaN晶体膜时,选择H2作反应气体兼载体,对GaN膜的形成起着非常有利的作用.
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