采用多弧离子镀方法在低温(173 K)下沉积了银和银铜薄膜,通过地面原子氧模拟试验系统考察了薄膜的耐原子氧性能,通过X射线衍射仪(XRD)和原子力显微镜(AFM)对薄膜的结构和耐原子氧性能进行了分析,并与室温下沉积的银薄膜进行了比较.结果表明:低温沉积和铜元素合金化,可减小银薄膜的晶粒尺寸,并提高其结构致密性;低温沉积的银铜薄膜表现出细密的结构,这有利于抑制原子氧对薄膜的氧化,从而使其比室温及低温下沉积的银薄膜具有更好的耐原子氧性能.
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