研究了双离子束沉积ＴｉＣ薄膜的形成．离子束反应溅射膜的显微硬度比ＣＨ_４高子束增强沉积膜的显微硬度高．ＸＰＳ，ＴＥＭ和ＡＥＳ分析表明后者硬度低的一个重要原因是ＣＨ_４离子束轰击引入过量的自由碳原子．
Synthesis of TiC films was investigated by dual ion beam deposition. Higher Knoop hardness number on the TiC films prepared by CH_4 ion beam enhanced deposition as comparison with that without CH_4 was obtained. The important reason, which showed by XPS, TEM and AES analyses, may be due to the excess C introduced to the TiC films during ion beam bombardment.
参考文献
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| [2] | MinZhang,LiWenzhi,LiHengde．In:HuangLed．,ThinFilmsandBeam-SolidInteractions．Amsterdam．Elsevier,1991:3462虞觉奇,易文质,陈邦迪,陈宏鉴编译．二元合金状态图集．上海:上海科学技术出版社,1987:2523OguriK,AraiT．ThinSolidFilms．1990 |
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