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采用直流反应磁控溅射在AlMn合金表面制备出ITO薄膜.采用扫描电镜、X射线衍射、紫外-可见光测试、磨损试验、盐雾试验、薄膜厚度测量和显微硬度试验等方法对制备的ITO薄膜表面进行检测分析.结果表明:在溅射功率210 W、衬底温度120℃、溅射时间20 min的条件下,AlMn合金表面的ITO薄膜晶粒尺寸细小,与基底结合良好,AlMn合金表面光泽度好,强度、硬度高,并具有一定的耐磨、耐蚀性能.

参考文献

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