本文对直流磁控溅射法制备NdFeB薄膜工艺进行了研究.采用单晶硅为基体材料,在不同的溅射功率、溅射气压、溅射时间等条件下制备薄膜.之后对薄膜进行了SEM、AFM、XRD分析结果表明,NdFeB薄膜沉积速率、表面形貌及相结构与溅射功率、溅射气压、溅射时间密切相关.并根据实验结果给出优化的NdFeB薄膜制备工艺.
参考文献
| [1] | Valetas M;Verite M;Bessaudou A;Cosset F;Vareille JC .Rf-sputtering deposition and magnetic characterisation of Nd-Fe-B thin films for microwave applications[J].Computational Materials Science,2005(1/3):163-167. |
| [2] | Y. G. Ma;Z. Yang;M. Matsumoto .Structural and magnetic properties of NdFeB thin films sputtered on W underlayers[J].Journal of Magnetism and Magnetic Materials,2003(3):341-346. |
| [3] | Ma YG;Li RS;Yang Z;Matsumoto M;Morisako A;Takei S .Effects of additive elements (Cu, Zr, Al) on morphological and magnetic properties of NdFeB thin films with perpendicular magnetic anisotropy[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2005(3):287-291. |
| [4] | M. Uehara .Microstructure and permanent magnet properties of a perpendicular anisotropic NdFeB/Ta multilayered thin film prepared by magnetron sputtering[J].Journal of Magnetism and Magnetic Materials,2004(0):281-286. |
| [5] | S.L. Chen;W. Liu;Z.D. Zhang .Microstructure and magnetic properties of anisotropic Nd-Fe-B thin films fabricated with different deposition rates[J].Journal of Magnetism and Magnetic Materials,2006(2):306-309. |
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