采用一种新的制备薄膜的技术--超声雾化气相沉积法(NVD),初步研制了一套采用该法制备薄膜的设备,已成功地用该设备制备出了TiO2薄膜.对薄膜形貌进行了初步的分析和研究,并用拉曼光谱对其进行了定性分析.
参考文献
| [1] | 安茂忠;王久林;杨哲龙 等.电沉积方法制备功能金属化合物薄膜[J].功能材料,1999,30(06):585. |
| [2] | O'Regan;Gratzcl M .[J].Nature,1991,353:737. |
| [3] | achU;Lupo D;Comte P et al.[J].Nature,1998,395:583. |
| [4] | 戴国瑞,刘旺,陈自力,姜月顺,诸真家,陈丽华,李铁津.TiO2 薄膜制备及其表面光电压谱研究[J].半导体学报,1992(06):372. |
| [5] | 关凯书,白皓然,尹衍升,张金升.玻璃表面纳米TiO2薄膜的制备及光催化性能研究[J].机械工程材料,2003(02):34-36. |
| [6] | LolP;Huppertz M;Mergel D .NucleationandgrowthinTiO2thinfilmspreparedbysputteringandevaporation[J].Thin Solid Films,1994,251(01):72. |
| [7] | Gan JY.;Wu TB.;Chang YC. .Dielectric property of (TiO2)(x)-(Ta2O5)(1-x) thin films[J].Applied physics letters,1998(3):332-334. |
| [8] | KimHS;Gilmer D C;Campbell S A et al.LeakagecurrentandelectricalbreakdowninmetalorganicchemicalvapordepositedTiO2dielectricsonsiliconsubstrates[J].Applied Physics Letters,1996,69(25):3860. |
| [9] | FukudaHisashi;Namioka Seigo;Miura Miho et al.StructuralandelecticalpropertiesofcrystallineTiO2thinfilmsformedbymetalorganicdecompositiotn[J].Japanese Journal of Applied Physics,1999,38(10):6034. |
| [10] | Hotsenpiller PAM.;Roshko A.;Rothman JB.;Rohrer GS.;Wilson GA. .HETEROEPITAXIAL GROWTH OF TIO2 FILMS BY ION-BEAM SPUTTER DEPOSITION[J].Journal of Crystal Growth,1996(1/4):779-785. |
| [11] | 王晓萍,于云,高濂,胡行方.TiO2薄膜的液相沉积法制备及其性能表征[J].无机材料学报,2000(03):573-576. |
| [12] | 张玉红,吴鸣,熊国兴,吴合进,杨维慎.溶胶-凝胶法制备TiO2复合陶瓷光催化膜--制备前驱物对膜性质的影响[J].功能材料,2000(05):536-538. |
| [13] | CarolienL;Huisman;Albert Goossens et al.Preparation of a nanostructrred composite of titanium dioxide and polythiophene: new routes towards 3D heterojunction solar cells laboratory for inorganic chemistry, faculty of applied sciences, delft university of technology, Julianalaan 136,2628 BL D[J].Synthetic Metals,2003,138:237. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%