研究了高速Ni镀液在脉冲电沉积条件下,工艺参数对Ni镀层的沉积速率、内应力、孔隙率及微观形貌等方面的影响规律.结果表明,温度、平均电流密度、频率、逆向脉冲系数及占空比对镀层性能和微观形貌有较大影响.与常规电沉积Ni方法相比,脉冲电沉积高速Ni还具有高效、节能等特点.
参考文献
| [1] | Ciszewski A;Posluszny S;Milczarek G;Baraniak M .Effects of saccharin and quaternary ammonium chlorides on the electrodeposition of nickel from a Watts-type electrolyte[J].Surface & Coatings Technology,2004(2/3):127-133. |
| [2] | C.S. Lin;P.C. Hsu;L. Chang;C.H. Chen .Properties and microstructure of nickel electrodeposited from a sulfamate bath containing ammonium ions[J].Journal of Applied Electrochemistry,2001(8):925-933. |
| [3] | 曾燕屏.换向脉冲电镀工艺对镀镍层应力的影响[J].电镀与精饰,1992(03):22. |
| [4] | 惠百平,费敬银,辛文利,刘江宏,王卫康.Zn-Ni合金电沉积过程中的渗氢行为[J].电镀与精饰,2006(02):10-13,41. |
| [5] | 万晓景.金属的氢脆[J].材料保护,1979(02):11. |
| [6] | 费敬银,马宗耀.电刷镀氢脆及防止措施[J].表面技术,2001(03):38-40. |
| [7] | R. Mishra;B. Basu;R. Balasubramaniam .Effect of grain size on the tribological behavior of nanocrystalline nickel[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2004(1/2):370-373. |
| [8] | Shen YF;Xue WY;Wang YD;Liu ZY;Zuo L .Mechanical properties of nanocrystalline nickel films deposited by pulse plating[J].Surface & Coatings Technology,2008(21):5140-5145. |
| [9] | Jing-Yin Fei;G. D. Wilcox .Electrodeposition of Zn-Co alloys with pulse containing reverse current[J].Electrochimica Acta,2005(13):2693-2698. |
| [10] | 康进兴,赵文轸,徐英鸽,孙立明.工艺参数对电沉积纳米晶镍沉积速率的影响[J].材料热处理学报,2008(03):152-155. |
| [11] | 费敬银,梁国正,辛文利.任意可调Zn-Co合金镀层的电沉积[J].中国化学工程学报（英文版）,2005(02):259-265. |
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