用脉冲直流等离子体增强化学气相沉积(PCVD)方法在高速钢(HSS)基体上制备了Ti-Si-N薄膜,重点从不同温度退火后薄膜相结构、晶粒尺寸和显微硬度的变化等方面,探讨了不同Si含量的Ti-Si-N薄膜的高温热稳定性.结果表明:Ti-Si-N薄膜在900℃以内退火处理后,晶粒尺寸和显微硬度并无明显突变,尤其是Si含量较低时,在800℃,晶粒尺寸和显微硬度几乎没有变化,表明Ti-Si-N薄膜具有非常良好的高温热稳定性,这可能与薄膜相形成在高温下仍为调幅分解有关.
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