运用直流平面磁控溅射技术在Hg3In2Te6单晶表面制备Pt金属电极,形成Pt/Hg3In2Te6接触,采用I-V测试仪在120~260 K温度范围内对其I-V特性进行测量.根据热电子发射模型,计算得到了Pt/Hg3In2Te6的肖特基势垒高度.结果表明:Pt/Hg3In2Te6形成具有整流特性的肖特基接触,肖特基势垒高度为0.46 eV.在120~260 K温度范围内,理想因子随温度增大逐渐从2.93减小至1.42.将Hg3In2Te6单晶制成红外探测器,发现了响应光谱在波长1.55 μm处峰值达到最大,在室温下峰值探测率D* 达到了1011 cm·Hz1/2·W-1.
参考文献
[1] | Grushka Z M;Gorley P N;Grushka O G et al.Mercury Indium Tellyride-a New Promising Material for Photronic Structures and Devices[J].Proceedings of SPIE,2006,6029:304-312. |
[2] | Grushka G G;Grushka Z M;Gavaleshko N P .The Electrical Properties of Hg3In2Te6 Compound[J].Ukrainian.Phys.J,1985,30:304-307. |
[3] | P. N. Gorlei;O. G. Grushka .An Impurity Band in Hg_3In_2Te_6 Crystals Doped with Silicon[J].Semiconductors,2003(2):168-171. |
[4] | Malik A;Vieira M;Fernandes M.Near-infrared Photodetectors Based on MIT Semiconductor Compound[A].,1999:433-442. |
[5] | Leute V;Schmidtke H M .Thermodynamics and Kinetics of the Quasibinary System Hg3Te3-In2Te3-II.Investigations by Electron Microprobe Measurements[J].Journal of Physics and Chemistry of Solids,1988,11:1317-1327. |
[6] | Sauders G A;Seddon T .Effect of Ordered Vacancies on Ultrasonic Wave Propagation in Some Mercury-indium Tellurides[J].Journal of Physics and Chemistry of Solids,1970,31:2495-2504. |
[7] | Halling T;Sauders G A;Lambson W A .Elastic Behavior under Pressure of the Vacancy Compounds Hg5Ga2Te8,Hg3In2Te6,and HgIn2Te4[J].Physical Review B,1982,26:5786-5797. |
[8] | Sauders G A;Seddon T .The Elastic Behaviour of Tetrahedral Materials with Vacant Sites[J].Journal of Physics and Chemistry of Solids,1976,37:873-882. |
[9] | Zhang XL;Sun WG;Kosyachenko LA;Zhang L .Temperature dependence of the energy bandgap of HgInTe[J].Infrared physics and technology,2008(3):256-258. |
[10] | Dieter K S.Semiconductor Material and Device Characterization[M].New York:John Wiley and Sons,Inc,1990:276-283. |
[11] | H. Sheng;S. Muthukumar;N. W. Emanetoglu;Y. Lu .Schottky diode with Ag on (1120) epitaxial ZnO film[J].Applied physics letters,2002(12):2132-2134. |
[12] | Rhoderich E H.Metal-semiconductor Contacts[M].London:Oxford University Press,1978:121-126. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%