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利用脉冲激光沉积技术(PLD),在不同的制备工艺条件下,分别在Pt/Ti/SiO2/Si基片上制备了Bi0.5Na0.5TiO3(BNT)系列的Bi0.5(Na0.7K0.2Li0.1)0.5TiO3(BNKLT)和K0.5Na0.5NbO3(KNN)系列的Li0.04(Na0.5K0.5)0.96(Nb0.775Ta0.225)O3(KNNLT)无铅压电陶瓷薄膜,并利用X射线衍射仪(XRD)、扫描电镜(SEM)和原子力显微镜(AFM)对薄膜的晶体结构及表面形貌进行了比较研究.研究结果表明:薄膜的衬底温度、沉积室的氧气压力和薄膜的热处理温度对BNT和KNN薄膜结构和形貌都有较大影响,且影响程度不同;在最佳制备工艺参数下,利用PLD制备的BNT和KNN无铅压电陶瓷薄膜都具有精细的表面结构.

参考文献

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