直流磁控溅射法制备ZnO:Zr透明导电薄膜及性能研究

材料导报, 2009, 23(6): 78-80.

直流磁控溅射法制备ZnO:Zr透明导电薄膜及性能研究

张化福 ^1, , 类成新 ^2, , 刘汉法 ^3, , 袁长坤 ^4,

1.山东理工大学物理与光电信息技术学院,淄博,255049

2.山东理工大学物理与光电信息技术学院,淄博,255049

3.山东理工大学物理与光电信息技术学院,淄博,255049

4.山东理工大学物理与光电信息技术学院,淄博,255049

基金项目: 山东理工大学功能材料创新团队支持计划项目(2006)

关键词： ZnO , Zr薄膜 , 磁控溅射 , 薄膜厚度 , 透明导电薄膜

Preparation and Characterization of Transparent Conducting Films ZnO: Zr Deposited by DC Magnetron Sputtering

利用直流磁控溅射法在玻璃衬底上制备了ZnO光电性能的影响.研究结果表明,厚度对薄膜的结构和电学性能有很大的影响.制备的ZZO薄膜为六角纤锌矿结构的多晶薄膜,具有C轴择优取向.在厚度为593nm时,薄膜的电阻率具有最小值1.9×10-3Ω·cm.所制备薄膜样品的可见光平均透过率都超过93%.

参考文献

[1]	Kim H.;Horwitz JS.;Kim WH.;Makinen AJ.;Kafafi ZH.;Chrisey DB. .Doped ZnO thin films as anode materials for organic light-emitting diodes[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(0):539-0.
[2]	Paul GK.;Bandyopadhyay S.;Sen SK.;Sen S. .Structural, optical and electrical studies on sol-gel deposited Zr doped ZnO films[J].Materials Chemistry and Physics,2003(1):71-75.
[3]	Lv M;Xiu XW;Pang ZY;Dai Y;Han SH .Influence of the deposition pressure on the properties of transparent conducting zirconium-doped zinc oxide films prepared by RF magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(16):5687-5692.
[4]	Coutal C;Azema A;Roustan J C .Fabrication and characterization of ITO thin films deposited by excimer laser evaporation[J].Thin Solid Films,1996,28(1-2):248.
[5]	Qadri SB.;Khan HR.;Pique A.;Horwitz JS.;Chrisey D.;Kim WJ. Skelton EF.;Kim H. .Transparent conducting films of In2O3-ZrO2, SnO2-ZrO2 and ZnO-ZrO2[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(0):750-754.
[6]	Ma HL.;Hao XT.;Ma J.;Yang YG.;Huang J.;Zhang DH.;Xu XG. .Thickness dependence of properties of SnO2 : Sb films deposited on flexible substrates[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2002(1/4):313-318.
[7]	余旭浒,马瑾,计峰,王玉恒,张锡健,程传福,马洪磊.薄膜厚度对ZnO：Ga透明导电膜性能的影响[J].功能材料,2005(02):241-243.
[8]	Lv M;Xiu XW;Pang ZY;Dai Y;Han SH .Transparent conducting zirconium-doped zinc oxide films prepared by rf magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(5):2006-2011.

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

直流磁控溅射法制备ZnO:Zr透明导电薄膜及性能研究

Preparation and Characterization of Transparent Conducting Films ZnO: Zr Deposited by DC Magnetron Sputtering

参考文献