采用室温沉积高温退火的方式在单晶MgO(001)基片上制备了具有马氏体相变的铁磁Ni-Mn-Ga薄膜.沉积态薄膜呈柱状晶结构,高温退火后柱状晶的晶界变得模糊.溅射气压为0.5 Pa和0.2 Pa的薄膜的马氏体相变起始温度分别为290 K和332K,溅射气压改变了薄膜成分,进而改变了相变温度.根据300K测得的磁化曲线,退火后溅射气压为0.5 Pa和0.2 Pa的薄膜分别显示出软磁和硬磁特性,这与M-T曲线的结果是相符的.室温下,0.5 Pa薄膜的磁畴形貌呈现出迷宫状；而0.2Pa样品则显现出马氏体的浮凸,与它的磁畴形貌直接关联.
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