在添加甘氨酸作为络合剂的水溶液体系中电沉积制备了Sm-Co薄膜,特征X射线谱(EDS)证明沉积膜由Sm、Co组成,X射线衍射分析表明Sm-Co膜为非晶态结构,扫描电镜观测结果显示,Sin-Co沉积膜表面颜色均匀,呈现银灰色但有裂纹和气泡.研究了沉积电压、主盐浓度配比、pH值、络合剂甘氨酸的添加等工艺参数对沉积膜的形貌及Sm含量的影响,结果表明,随着沉积电压的升高,沉积膜中Sm的含量先增加后减少,当沉积电压为1.5～2.0V vs.SCE时沉积膜的形貌最好,甘氨酸的添加对Sin-Co的形成有重要作用.
The rare earth-transition metal alloys of Sm-Co alloy film on Cu substrate are electrodeposited from aqueous solution of glycin as additive. EDS indicates the deposited film contains Sm and Co;X-ray diffraction spectra shows the metallic deposits are generally amorphous;SEM observation shows that Sm-Co film surface color is uniform, but has crack and bubble. The effects of deposition voltage, the main concentration ratio, pH value,the addition of complexing agents such as glycine electrodeposition process parameters on film morphology and alloy content are discussed. The study shows that deposition film in the Sm content increases after reduction as the deposition voltage increases. Membrane morphology is the best when the deposition voltage is 1. 5～2. 0V vs. SCE.
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