氩离子溅射刻蚀对Ti-Si-C纳米复合薄膜XPS分析的影响

稀有金属材料与工程, 2014, 43(4): 977-981.

氩离子溅射刻蚀对Ti-Si-C纳米复合薄膜XPS分析的影响

姜金龙 ^1, , 陈娣 ^2, , 王琼 ^3, , 杨华 ^4, , 魏智强 ^5,

1.兰州理工大学,甘肃兰州730050;中国科学研究院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000

2.兰州理工大学,甘肃兰州730050

3.兰州理工大学,甘肃兰州730050

4.兰州理工大学,甘肃兰州730050

5.兰州理工大学,甘肃兰州730050

基金项目: 国家自然科学基金资助(5110586)

关键词： Ti-Si-C纳米复合薄膜 , 氩离子溅射刻蚀 , X射线光电子能谱 , 键合结构

Influence of Ar Ion Sputter-Etching on XPS Analysis of Ti-Si-C Nanocomposite Film

Jiang Jinlong ^1, , Chen Di ^2, , Wang Qiong ^3, , Yang Hua ^4, , Wei Zhiqiang ^5,

1.兰州理工大学,甘肃兰州730050;中国科学研究院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000

2.兰州理工大学,甘肃兰州730050

3.兰州理工大学,甘肃兰州730050

4.兰州理工大学,甘肃兰州730050

5.兰州理工大学,甘肃兰州730050

Keywords： Ti-Si-C nanocomposite films , Ar+ sputter-etching , XPS , bonding configurations

通过中频非平衡磁控溅射Ti80Si20复合靶在氩气和甲烷混合气氛中沉积Ti-Si-C复合薄膜.采用X射线衍射仪、Raman光谱和X射线光电子能谱分析薄膜微结构.结果显示:制备的薄膜为非晶碳(a-C∶Si∶H)包裹约10 nm TiC晶粒的复合结构,氩离子溅射刻蚀对XPS分析结果有显著影响.随氩离子刻蚀溅射刻蚀时间增加,薄膜表面C、O原子含量明显降低,而Ti、Si原子含量增加.氩离子溅射刻蚀导致薄膜非晶碳相发生石墨化转变,即sp3C-C(H)/sp2C-C比率减小,同时,C-Ti*/C-Ti和C-(Ti+Ti*)/C-C强度比明显增加.

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