含氟的复合磨料在工业上已广泛应用,利用X-射线衍射、扫描电镜、激光粒度仪和原子力显微镜等测试手段,比较了不同掺氟方式和氟源得到含氟复合磨料的物性,以及对单晶硅的抛光效果和抛光表面性能的影响.结果表明,在80℃共沉淀、以掺氟量为7％掺入氟化物及1000℃下煅烧所得复合磨料具有较低的振实密度、粒度均匀的球型粒子,复合磨料中CeLa2O3F3含量相对较高,用于单晶硅的抛光可以得到较好的抛光表面性能;碳酸稀土直接喷撒氢氟酸在同等煅烧下制得复合磨料其抛光速率较高,但抛光表面性能较差.
参考文献
| [1] | Myoung-Hwan Oh;Jun-Seok Nho;Seung-Beom Cho .Polishing behaviors of ceria abrasives on silicon dioxide and silicon nitride CMP[J].Powder Technology: An International Journal on the Science and Technology of Wet and Dry Particulate Systems,2011(3):239-245. |
| [2] | Y. G. Wang;L. C. Zhang;A. Biddut .Chemical effect on the material removal rate in the CMP of silicon wafers[J].Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear,2011(3/4):312-316. |
| [3] | Polishing behaviors of single crystalline ceria abrasives on silicon dioxide and silicon nitride CMP[J].Microelectronic engineering,2010(12):2633-2637. |
| [4] | Yang Chen;Renwei Long .Polishing behavior of PS/CeO_2 hybrid microspheres with controlled shell thickness on silicon dioxide CMP[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2011(20):8679-8685. |
| [5] | Yang Chen;Jinxia Lu;Zhigang Chen .Preparation, characterization and oxide CMP performance of composite polystyrene-core ceria-shell abrasives[J].Microelectronic engineering,2011(2):200-205. |
| [6] | Chung, S.-H.;Lee, D.-W.;Kim, M.-S.;Lee, K.-Y. .The synthesis of silica and silica-ceria, core-shell nanoparticles in a water-in-oil (W/O) microemulsion composed of heptane and water with the binary surfactants AOT and NP-5[J].Journal of Colloid and Interface Science,2011(1):70-75. |
| [7] | 孙增标,刘玉岭,刘效岩,闫宝华,张研.SiO_2/CeO_2混合磨料对微晶玻璃CMP效果的影响[J].半导体技术,2010(01):72-74. |
| [8] | Ping Liu;Hong Lei;RuLing Chen .Polishing properties of porous silica abrasive on hard disk substrate CMP[J].International Journal of Abrasive Technology,2010(3):228-237. |
| [9] | 赵巧云,周建伟,刘玉岭,刘效岩,刘海晓.ULSI硅衬底CMP速率稳定性的研究[J].半导体技术,2010(12):1167-1169,1182. |
| [10] | Y.B. Tian;L. Zhou;J. Shimizu;Y. Tashiro;R.K. Kang .Elimination Of Surface Scratch/texture On The Surface Of Single Crystal Si Substrate In Chemo-mechanical Grinding (cmg) Process[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2009(7):4205-4211. |
| [11] | Maosheng Fu;Lianghua Wei;Yanhua Li .Surface charge tuning of ceria particles by titanium doping: Towards significantly improved polishing performance[J].Solid state sciences,2009(12):2133-2137. |
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