为探索溶胶浸渗处理对电子束物理气相沉积（EB-PVD）制备8％摩尔比的氧化钇稳定氧化锆（8YSZ）涂层微观结构及性能的影响，采用EB-PVD工艺在沉积速率1μm／min的条件下制备了8YSZ电解质涂层．制备态涂层的断面表现为疏松的柱状晶结构，导致涂层的气密性差，因此对涂层进行了溶胶浸渗处理，即首先在负压下将涂层浸渗在钇锆的溶胶内，再进行550℃保温2h的热处理，SEM分析表明，溶胶分解产物可以堵塞柱状晶间的孔隙，其渗入涂层的深度可达3μm．浸渗处理后，涂层的气体扩散系数由未处理态的6．78×10－5cm4／（N·8）降低至8次浸渗处理后的6．54×10－6cm4／（N·s）。8次溶胶浸渗处理后涂层的电导率相比处理前提高不超过10％。
To explore the effects of sol infiltration treatment on YSZ electrolyte coatings prepared by electron beam physical vapor deposition(EB -PVD) ,8YSZ electrolyte coatings were prepared by EB -PVD at a deposition rate of 1μm/min. Cross-sectional SEM analysis showed that the asdeposited coatings exhibited a loose columnar structure resulting in bad gas tightness. So a sol infiltration treatment was performed by immersing EB - PVD coatings in a zirconium and yttrium sol followed by a heat treatment. SEM analysis demonstrated that the sol could permeate the coatings with an impregnation depth of 3 gin. The intergranular pores and gaps of as-deposited coatings had been stuffed by decomposed products from sol. After infiltration treatment ,the coefficient of gas permeability dropped from 6.78 × 10 -5 cm4/( N · s ) for asdeposited coating to 6.54 × 10 -6 cm4/( N · s ) for the coating after 8 times of infiltra- tion treatment. However,the electrical conductivity of YSZ coating even after 8 times of sol infiltration treatment in- creased no more than 10% Compared to that of asdeposited coating.
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