以90wt%In和10wt%Sn铟锡合金为靶材,采用直流磁控反应溅射法在玻璃基片制备ITO透明导电薄膜.用紫外-可见光分光光度计、四探针电阻仪、XRD和SEM分别测试了ITO薄膜的紫外-可见光透射光谱、方块电阻、薄膜的结构和表面形貌.研究了氧分压对ITO薄膜性能的影响.实验结果表明,ITO薄膜随着氧分压的增加,薄膜紫外透射光谱的吸收截止边带向短波长方向漂移.随着氧分压的增大,ITO薄膜的方块电阻增加,结晶程度变好,晶粒尺寸变大.
参考文献
| [1] | Sueva D;Georgiev S S;Nedev N et al.A neutron detector based on an ITO/p-Si structure[J].Vacuum,2000,58:308. |
| [2] | Teixeira V.;Cui HN.;Meng LJ.;Fortunato E.;Martins R. .Amorphous ITO thin films prepared by DC sputtering for electrochromic applications[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(0):70-75. |
| [3] | Meng Li Jian;Frank Placido .Annealing effect on ITO thin films prepared by microwave-enhanced dc reactive magnetron sputtering for telecommunication applications[J].Surface and Coatings Technology,2003,166:44. |
| [4] | Sung Kyu Park;Jeong In Han;Won Keun Kim;Min Gi Kwak .Deposition of indium-tin-oxide films on polymer substrates for application in plastic-based flat panel displays[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(1/2):49-55. |
| [5] | Herrero J;Guillen C .Transparent films on polymers for photovoltaic applications[J].Vacuum,2002,67:611. |
| [6] | Bender M;Seelig W .Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films[J].Thin Solid Films,1998,326:72. |
| [7] | Mientus R.;Ellmer K. .Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode[J].Surface & Coatings Technology,2001(0):748-754. |
| [8] | Yutaka Sawada;Chikako Kobayashi;Shigeyuki Seki et al.Highly-conducting indium-tin-oxide transparent films fabricated by spray CVD using ethanol solution of indium(Ⅲ)chloride and tin(Ⅱ)chloride[J].Thin Solid Films,2002,409:46. |
| [9] | Alam MJ.;Cameron DC. .Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(0):455-459. |
| [10] | Kim H.;Pique A.;Gilmore CM.;Chrisey DB.;Horwitz JS. .Electrical and optical properties of indium tin oxide thin films grown by pulsed laser deposition[J].Applied physics, A. Materials science & processing,1999(Suppl.1):S447-S450. |
| [11] | Kim D.;Kim S. .Effect of ion beam energy on the electrical, optical, and structural properties of indium tin oxide thin films prepared by direct metal ion beam deposition technique[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):218-222. |
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