采用SP0806AS中频磁控溅射镀膜机,在硅(100)和高速钢基体上,采用双石墨靶在不同功率下沉积了类金刚石薄膜.研究表明,在功率为5～7 kW下薄膜具有较低的ID/IG比;所得薄膜表面平整,粗糙度Ra值在1.5～2.8 nm之间,薄膜厚度随功率增加而增大;在100～200 nm Ti膜作为过渡层条件下,薄膜纳米硬度和弹性模量随功率增加呈先增大后减小趋势,硬度/杨氏模量比值先增大后减小,当功率为7 kW时具有较高值;划痕实验临界载荷随功率增加先增大后减小,最大可大于50 N;薄膜的摩擦系数较小,平均摩擦系数可小于0.15;在50 g载荷下,薄膜磨穿的时间超过300 min.确定SP0806AS中频磁控溅射镀膜机沉积类金刚石薄膜的最佳功率范围是5～7 kW.
Diamond-like carbon (DLC) thin films were deposited onto Si (100) and high speed steel substrates by mid-frequency magnetron sputtering system (SP0806AS, Beijing Power tech Co., Ltd.) with dual graphite targets of different target powers (3-8 kW). It is shown that, with the target power in the range of 5-7 kW, the as-prepared DLC thin films would have relatively low ID/IG in Raman spectra. The surfaces of DLC films are smooth with roughness Ra in the range of 1.5-2.8 nm. The thickness of the films increases with increasing target powers applied. With the increase in target powers, the nanohardnesses (H) and elastic moduli (E) of the DLC films with a Ti transition layer of 100-200 nm in thickness increase first, and then dropped down, and have maximum values in power range of 5～7 kW; the ratio of H/E has the same variation tendency, and it reaches the maximum when the power is 7 kW. The critical load in scratch test increases first with increasing target powers, reaches a maximum of 50 N when the power is 7 kW, and decreases thereafter. The friction coefficients of the DLC films are fairly low, and they may lower down to 0.13 in the power range of 3-8 kW. When the load was 50 g in tribological test, the worn-out time of the optimum DLC film (7 kW, about 400 nm in thickness) was more than 300 min. Therefore it was determined that the optimum target power for the deposition of DLC films by SP0806AS Mid-frequency magnetron sputtering system was 5～7 kW.
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