利用常压化学气相沉积法(APCVD)在玻璃基板上沉积制备了钒(V)掺杂的氮化钛(TiN)薄膜.利用X射线衍射仪(XRD)、光电子能谱仪(XPS)、扫描电子显微镜(SEM)、四探针电阻仪和分光光度计等对TiN薄膜的结构、形貌、以及光电性能进行了分析.结果表明,薄膜呈典型的粒状结构.随着沉积温度的升高,薄膜的结晶强度不断增加,薄膜中V元素的比例增大,方块电阻逐渐降低.600℃时薄膜在近红外光区的反射率接近50%,在中远红外区的反射率达到93.74%,得到了兼具阳光控制功能和低辐射功能的V掺杂的TiN镀膜玻璃.
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