为了探究C、Cr两种主要成膜元素在非晶碳膜中的存在和分布状态,采用非平衡磁控溅射离子镀技术制备出了具有梯度过渡层的掺Cr碳膜,利用高分辨透射电子显微术(HRTEM)分析了薄膜的显微组织.结果表明,沉积在硅晶片上的纯Cr底层具有典型的柱状晶结构,其上的梯度过渡层则由各种形态的Cr纳米晶和富碳非晶基质构成.沿薄膜生长方向,随着Cr含量逐渐降低,过渡层中的Cr纳米晶依次形成层片晶、岛状晶和微晶.掺Cr碳膜的工作层则是一种非晶的纳米多层膜.膜中的C始终以非晶态存在,所观察到的结晶相均属金属Cr,同时纯Cr层柱状晶和过渡层中的各种Cr纳米晶都不同程度地具有(110)晶面的择优取向.
In order to reveal how two main film forming elements, C and Cr, exist and distribute in amorphous carbon film, Cr-doped carbon film with gradient transition layer was prepared by unbalanced magnetron sputter ion plating deposition technique. High resolution transmission electron microscopy (HRTEM) was utilized to characterize the film' s microstructure. The observational results show that Cr bottom layer deposited on Si wa-fer is typical columnar crystal, upon which the gradient transition layer consisting of various morphologies Cr nanocrystalline and carbon-rich noncrystalline matrix exists. These Cr nanocrystallines in the transition layer form in sequence lamellar crystal, island-like crystal and microcrystal along the film' s growth direction with decreasing Cr content. Working layer of the Cr-doped carbon film is a noncrystalline nano-muhilayer film. C in the film always exists in the form of amorphous carbon, and all crystal phases found in the film belong to metallic chromium. Furthermore, both Cr columnar crystal and various morphologies Cr nanocrystalline in the transition layer exhibit more or less preferred orientation of (110) crystal plane.
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