物理气相输运法(PVT)是实验室最为常见的碳化硅(SiC)大块单晶生长方法.本文在碳化硅晶体生长模型化研究中,针对碳化硅单晶PVT生长过程中的传热传质等现象引入了对流传热中的场协同原理,利用这一原理对生长室内的流场温度场进行了优化,并对改良前后分别进行了数值模拟,研究了该原理对晶体生长的影响.实验室碳化硅单晶的生长成功率从优化设计前的30%提高到90%.
参考文献
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