以硫脲(SC(NH2)2)和三氯化锑(SbC13)为主要原料,采用仿生法在玻璃基板上制备了Sb2S3薄膜,研究了热处理温度对薄膜晶相、显微结构和禁带宽度等的影响.采用X-射线衍射仪(XRD)、原子力显微镜(AFM)和紫外-可见自记式分光光度计等对薄膜的相组成、显微结构和光学性能进行了表征.结果表明:300℃热处理后获得的薄膜为无定形薄膜;随热处理温度的提高,薄膜的结晶性能变好,薄膜生长和取向性增强;随着热处理温度从300℃提高到500℃,薄膜的光学带隙由2.06 eV降低到1.88 eV.
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