采用射频磁控溅射法在玻璃衬底上制备出了具有不同厚度ITO同质缓冲层的ITO薄膜.利用X射线衍射、半导体特性测试仪、紫外-可见光分光光度计等测试了薄膜的特性.结果表明:与单层ITO薄膜相比,具有厚度16nm ITO同质缓冲层的ITO薄膜的电阻率下降了30％,薄膜的电阻率达到2.65×10-4 Ω·cm,可见光范围内的平均透过率为91.5％.
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