目的 研究激光薄膜的膜系结构及提高激光损伤阈值的制备工艺.方法 基于场强优化分布,设计Si基底上3～5 μm增透、1064 nm截止的激光薄膜,对镀后的薄膜进行激光辐照处理和真空退火处理,分析薄膜的相关性能.结果 薄膜内部不同的场强分布会对其激光损伤特性产生不同的影响.在满足光学性能的情况下,采用适当的膜系结构,使膜层/膜层界面处的电场强度降低,或者使最大电场强度存在于激光损伤阈值较高的材料中,可有效提高整个膜系的激光损伤阈值.采用激光辐照处理和真空退火处理,也可以提高薄膜的激光损伤阈值.结论 经过优化设计、激光辐照和真空退火处理,最终可使Si基底上红外减反薄膜的激光损伤阈值提高到6.2 J/cm2.
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