主要讨论了多层薄膜SiO2/NiFe/Ru的磁学特性,着重研究了保护层Ru对磁性薄膜NiFe的厚度及磁性的影响.采用X射线衍射仪及X射线光电子能谱仪对该薄膜进行了结构测试和深度剖析,并且运用XPSPeak 4.1拟合软件对获得的Ru3d的高分辨XPS谱进行了计算机拟合分析;结果表明,Ru更加适合于做保护层,渴望在自旋电子器件上得到应用.
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