氟化非晶碳(a-C:F)薄膜是一种电、光学新材料.介绍了它的制备方法,对其制备工艺作了较全面的探讨;分析了该膜制备方法和工艺参数对薄膜组分及化学键结构的影响;研究了该膜的电学、光学、热学、力学等物理性质及其在相关方面的应用,并对该膜的物理性质与制备工艺参数的关联作了详细的论述;指出介电常数和热稳定性的矛盾是阻碍该膜实用化的主要原因.
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