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用磁控溅射方法制备NiFeSiMnMo/Cu/NiFeSiMnMo多层膜;理论研究了多层膜巨磁阻抗效应与磁导率的关系;实验研究了NiFeSiMnMo/Cu/NiFeSiMnMo多层膜结构的磁导率和巨磁阻抗比.在驱动频率3MHz下△μ′/μ′(%)出现800%的最大值,巨磁阻抗比出现14.4%的最大值.

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