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使用平行平晶做分光元件建立了剪切量随平行平晶偏转角可调的横向剪切实时干涉系统,该系统在最佳偏转角下所得最大剪切量与平行平晶的厚度成正比.实验表明,当系统的横向剪切量大于被测火焰畸变波面宽度的一半时,剪切域中的非核心剪切区将出现半幅以上的双曝光条纹,以之进行干涉测温处理可以避开传统剪切干涉测量技术所必需的剪切相位还原算法.这意味着实时双曝光条纹可以简单地通过大剪切量横向剪切干涉系统得到.

参考文献

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