针对目前金刚石膜存在电阻率低,使辐射剂量计器件的信噪比不大、X光灵敏度较低的问题,采用优化的氧等离子体和氮等离子体对生成膜进行原位后处理.结果表明:氧等离子体处理比氮等离子体更能有效的刻蚀石墨等非金刚石成分;处理后样品生成膜的电阻率可提高至少4个数量级;优化的等离子体处理工艺能提高金刚石膜对X射线的响应.
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