通过对氧化铝、莫来石陶瓷微珠进行抛光研究.研究了不同抛光条件,水基、油基等不同基体,不同磨料对于微珠抛光效果的影响.证实氧化铈对微珠抛光有良好效果,并尝试从微观角度分析原因.
参考文献
[1] | Jongwon Seok;Cyriaque P. Sukam;Andrew T. Kim;John A. Tichy;Timothy S. Cale .Multiscale material removal modeling of chemical mechanical polishing[J].Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear,2003(3/4):307-320. |
[2] | Yuan J L.[J].Journal of Materials Processing Technology,2002(129):171. |
[3] | Jacek Kolacz;Knut Lyng Sandvik.[J].Mineral Processing,1996(44):361. |
[4] | Zhaowei Zhong .Surface finish of precision machined advanced materials[J].Journal of Materials Processing Technology,2002(2/3):173-178. |
[5] | Ming Jiang;N. O. Wood;R. Komanduri .On chemo-mechanical polishing (CMP) of silicon nitride (SI{sub}3N{sub}4) workmaterial with various abrasives[J].Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear,1998(1):59-71. |
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