采用溶胶-凝胶工艺制备了Bi4-xLaxTi3O12和Bi4Ti3-yNbyO12铁电薄膜,研究了La、Nb掺杂对薄膜介电性能和C-V特性的影响.研究表明,在x<0.75、y<0.06范围内,随La、Nb掺杂量的增加, Bi4-xLaxTi3O12和Bi4Ti3-yNbyO12薄膜的介电常数和C-V特性曲线回滞窗口增大,介电损耗和漏电流密度减小.x>0.5时,Bi4-xLaxTi3O12薄膜可获得大于1.8 V的C-V回滞窗口,且经1010极化开关后其回滞窗口的减小未超过6%;而Nb掺杂对增大Bi4Ti3-yNbyO12薄膜C-V回滞窗口的作用更加明显,但经1010极化开关后,其回滞窗口的减小较为明显,并出现一定平移.
参考文献
[1] | Sun Z H;Tang M H;Zhou Y C et al.Research Progress on the Retention Properties of Ferroelectric Memories[J].Optics & Optoelectronic Technology,2007,25(05):181-184. |
[2] | Tang M H;Zhou Y C;Zheng X J et al.Structural and Electrical Properties of Metal-ferroelectric-insulator-semiconductor Transistors Using a Pt/Bi3.25Nd0 75Ti3O12/Y2O3/Si Structure[J].Solid-State Electronics,2007,94(01):105-114. |
[3] | 范素华,张伟,王培吉,张丰庆,冯博楷,马建平.膜厚对Nd掺杂钙锶铋钛铁电薄膜结构及性能的影响[J].人工晶体学报,2008(02):466-470. |
[4] | Wang H;Ren M F .Electrical Properties of Pt/SrBi2Ta2O9/Bi4Ti3O12/p-Si Heterostructure Prepared by Sol-gel Processing[J].Journal of Materials Research,2006,221(07):1782-1786. |
[5] | H. Wang;M. F. Ren .Characteristics of Ag/Bi3.25La0.75Ti3O12/p-Si heterostructure prepared by sol-gel processing[J].Journal of Sol-Gel Science and Technology,2007(3):247-250. |
[6] | C.P. Cheng;M.H. Tang;J.Y. Yang;Y.H. Deng .Ferroelectric properties of Bi_(3.4)Dy_(0.6)Ti_3O_(12) thin films crystallized in N_2[J].Materials Letters,2008(16):2450-2453. |
[7] | S.K. Singh;H. Ishiwara .Ferroelectric properties enhancement in niobium-substituted Bi_(3.25)La_(0.75)Ti_3O_(12) thin films prepared by chemical solution route[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):90-95. |
[8] | Park B H;Kang B S;Bu S D et al.Lanthanum-substituted Bismuth Titanate for Use in Non-volatile Memories[J].Nature,1999,401:682-684. |
[9] | Yuji Noguchi;Masaru Miyayama .Large remanent polarization of vanadium-doped Bi_(4)Ti_(3)O_(12)[J].Applied physics letters,2001(13):1903-1905. |
[10] | Mao X Y;He J H;Zhu J et al.Structural,Ferroelectric,and Dielectric Properties of Vanadium-doped Bi4-xTi3-xVxO12[J].Journal of Applied Physics,2006,2100:044104-0441-5. |
[11] | Maffei N;Krupanidhi S B .Electrical Characteristics of Excimer Laser Ablated Bismuth Titanate Films on Silicon[J].Journal of Applied Physics,1992,272(08):3617-3636. |
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