利用静态高压釜,在330℃的10%NaOH+10 g/L PbO腐蚀介质中,对690TT合金进行5～60 d的浸泡实验,结果表明:690TT合金氧化膜由NiO、NiFe<,2>O<,4>和NiCr<,2>O<,4>构成.合金的氧化膜分层,靠近基体的腐蚀产物为混杂的富Cr和富Ni氧化物,是沿晶腐蚀和表面均匀腐蚀综合作用所致.中间层主要以NiCr<,2>O<,4>为主,外层是NiFe<,2>O<,4>以及NiO<,0>氧化膜同时具有n型和P型半导体特征,内层富Cr的氧化物为p型半导体,而外层富Fe的氧化物为n型半导体.
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