采用直流磁控溅射方法在玻璃衬底上室温生长了AZO/Cu双层薄膜,Cu层厚度控制在9nm,研究了AZO层厚度对薄膜电学和光学性能的影响。当AZO层厚度为20～80nm时,AZO/Cu双层薄膜具有良好的综合光电性能,方块电阻为12～14Ω/sq,可见光平均透过率为70～75%,品质因子为2×10-3～5×10-3Ω-1。AZO/Cu双层薄膜可以观察到Cu（111）和ZnO（002）的XRD衍射峰。通过退火研究表明,AZO/Cu双层薄膜的光电性能可在400℃下保持稳定,具有良好的热稳定性。本研究制备的透明导电AZO/Cu双层薄膜具有室温制程、综合光电性能良好、结晶性能较好、稳定性高的优点,可以广泛应用于光电器件透明电极及镀膜玻璃等领域。
AZO/Cu bilayer films were prepared on glass substrates by DC magnetron sputtering at room temperature.The influence of AZO layer thickness on the electrical and optical properties of AZO/Cu bilayer films with the Cu layer thickness of 9 nm was studied.At the optimized AZO layer thickness of 20~80nm,the AZO/Cu bilayer films have superior photoelectric properties,such as sheet resistance of 12~14Ω/sq,average visible transmittance of 70~75%,and figure of merit of 2×10-3~5×10-3Ω-1.The Cu（111） and ZnO（002） diffraction peaks could be detected in the X-ray diffraction（XRD） patterns.The optical and electrical properties of AZO/Cu bilayer films have good stability even at 400℃.The combination of room-temperature growth process,superior transparent-conductive properties,acceptable crystalline quality,and high thermal stability enable the AZO/Cu bi-layer films to be widely used in various fields such as transparent electrodes of optoelectronic devices and coated glasses.
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