概述了国内外掺锑氧化锡(ATO)透明导电薄膜制备技术的研究现状,包括溶胶凝胶法、射频磁控溅射法、喷雾热解法、化学气相沉积法等,对比分析了各种制备方法的优缺点和及其所制备薄膜的性能;介绍了薄膜厚度、锑掺杂浓度、退火工艺参数等对薄膜光学性能的影响,提出了开发具有良好光学性能ATO薄膜需要解决的问题.最后对ATO薄膜今后的发展方向进行了展望.
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