从氧空位、表面粗糙度及晶界三方面,讨论了氧分压对射频反应磁控溅射ZrO2薄膜光学透射率的影响.结果表明,随氧分压增大,氧空位的减少使单斜相逐渐占优,缺氧状况的改善使薄膜透射率逐渐升高;高氧分压下,出现颗粒聚集现象,表面粗糙度大幅增加及晶粒的聚集长大,使薄膜透射率下降.
参考文献
| [1] | Teixeira V.;Monteiro A.;Duarte J.;Portinha A. .Deposition of composite and nanolaminate ceramic coatings by sputtering[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(3/4):477-483. |
| [2] | 郑航.应用于微电子的硅基氧化锆薄膜性质研究[J].半导体技术,2002(08):71-73,77. |
| [3] | Koski K;Holsa J;Juliet P .Properties of zirconium oxide thin films deposited by pulsed reactive magnetron sputtering[J].Surface and Coatings Technology,1999,120-121:303. |
| [4] | 刘恩科;朱秉升.半导体物理学[M].上海:上海科学技术出版社,1984:207. |
| [5] | Gao PT.;dos Santos MP.;Teixeira V.;Andritschky M.;Meng LJ. .Characterisation of ZrO2 films prepared by rf reactive sputtering at different O-2 concentrations in the sputtering gases[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2000(2):143-148. |
| [6] | 路新瀛;梁开明;顾守仁 等.氧空位对氧化锆相结构稳定性及相变过程的影响[J].硅酸盐学报,1996,24(06):670. |
| [7] | Stefano Fabris;Anthony T. Paxton;Michael W. Finnis .A stabilization mechanism of zirconia based on oxygen vacancies only[J].Acta materialia,2002(20):5171-5178. |
| [8] | Gao PT.;dos Santos MP.;Teixeira V.;Andritschky M.;Meng LJ. .Characterisation of ZrO2 films prepared by rf reactive sputtering at different O-2 concentrations in the sputtering gases[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2000(2):143-148. |
| [9] | Kao A S;Gorman G L .Modification of zirconia film properties by low-energy ion bombardment during reactive ion-beam deposition[J].Journal of Applied Physics,1990,67(08):3826. |
| [10] | Garvie R C .Stabilization of the tetragonal structure in zirconia microcrystals[J].Journal of Physical Chemistry,1978,82(02):218. |
| [11] | Ji Z.;Ferber MK.;Rigsbee JM.;Haynes JA. .Metastable tetragonal zirconia formation and transformation in reactively sputter deposited zirconia coatings[J].Surface & Coatings Technology,2001(2/3):109-117. |
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