采用硫化Cu-In前驱膜的方法制备CuInS2薄膜,通过分析CIS薄膜制备过程中不同阶段样品中的氧,讨论了氧的来源及其存在形态,以及对CIS层开路电压可能造成的影响.用扫描电镜(SEM)和能量色散谱仪(EDS)研究前驱膜的形貌及其成分,用X射线衍射仪(XRD)表征薄膜的结构,用俄歇电子能谱(AES)对硫化薄膜中各元素沿深度方向的分布进行了检测,最后用I-V测试仪对硫化膜的开路电压进行测量.结果表明,CuInS2薄膜中的氧来源于Cu-In前驱膜,氧主要以Cu2In2O5的形式存在于CIS/Cu-In界面处,由于氧化物在硫化反应过程中影响了Cu和In向外表面的扩散,从而影响了CIS薄膜的成分和CIS太阳能电池的性能.
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