主要研究了不同保护层Ta和Ru对磁性薄膜NiFe的厚度及磁性的影响.通过观察可以看出,NiFe/Ta,NiFe/Ru界面间产生了磁矩为零的部分层即所谓的"死层",其厚度分别为(1.5±0.2)nm,(1.2±0.2)nm(厚度误差在0.2nm范围内).利用两种保护层时虽然避免不了"死层"现象的出现,但是发现,Ru作为保护层时产生的"死层"厚度比Ta作为保护层时的小.为了进一步证实这一点,我们采用X射线衍射仪及X射线光电子能谱仪对该两种薄膜进行了结构测试和深度剖析,并且运用XPSPeak 4.1拟合软件对获得的Ta4f和Ru3d的高分辨XPS谱进行了计算机拟合分析;结果表明,Ru较Ta更加适合于做保护层,渴望在自旋电子器件上得到应用.
参考文献
| [1] | Baibich M N;Broto J M;Fert A et al.[J].Physical Review Letters,1988,61:2472-2475. |
| [2] | Julliere M .[J].Physics Letters A,1975,54:225. |
| [3] | 拜山·沙德克 等.[J].日本应用磁器学会志,2005,29:459-462. |
| [4] | Lenssen K M H;Kools J C S;de Veirman A E M et al.[J].Journal of Magnetism and Magnetic Materials,1996,156:63-64. |
| [5] | 于广华;马纪东 等.[J].科学通报,2002,47:1601. |
| [6] | Yu GH;Li MH;Teng J;Zhu FW;Lai W .Interface reactions in Ta/Ni81Fe19/Ta structures and their influence on magnetic properties[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1/2):208-214. |
| [7] | Yu GH.;Zhao HC.;Zhu FW.;Xiao JM.;Chai CL. .Interface reaction of Ta/NiO and its effect on exchange coupling[J].Journal of Magnetism and Magnetic Materials,2001(1):61-64. |
| [8] | Kowalewski M;Butler W H et al.[J].Applied Physics,2000,87:5732. |
| [9] | Xiaofang Bi;Liqing Gan;Xiaoyan Ma .Change of coercivity of magnetic thin films with non-magnetic layers and applications to spin valve[J].Journal of Magnetism and Magnetic Materials,2004(3):321-325. |
| [10] | Massalshi T B;Murray J L;Bennett L H.Alloy Phase Diagrarns[M].USA:American Society for Metals,1986:1762. |
| [11] | Lin T.;Schwickert MM.;Harp GR.;Tomaz MA. .Structure and magnetic properties of Ru/Fe(001) multilayers[J].Physical Review.B.Condensed Matter,1998(2):862-868. |
| [12] | Hayes B .[J].American Scien-tists,2002,90:212. |
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