介绍了一种新型的在钢铁基体上制备钽薄膜的方法. 该方法用网状钽片作阴极, 它既是放电气体的离解源, 又是沉积钽膜的钽离子供给源, 其设备简单、价格低廉. 实验中发现, 在各个参数配比合适的条件下, 可制备出结构为bcc(体心立方)和tetragonal(四方晶系)的钽薄膜. 薄膜较致密且均匀, 与基体的结合好. 同时分析了在最佳工艺参数条件下合成钽膜的组织结构、表面和断口形貌、结合力等.
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