为了提高MoS2薄膜在室温潮湿大气条件下的摩擦磨损性能,通过磁控反应溅射制备了MoS2/Ti/C复合薄膜.采用能谱仪(EDS)、X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)对薄膜的成分、相组成和形貌进行表征,采用纳米压痕仪测试薄膜的结合力、纳米压痕硬度,采用多功能微摩擦磨损试验机测试薄膜的摩擦系数,并采用真彩色高分辨率共聚焦显微镜观察薄膜的磨损形貌.结果表明:与MoS2薄膜相比,含非晶态Ti和C的MoS2/Ti/C复合薄膜的(002)滑移面平行于基体表面生长,不含(100)面,结构致密,与基体的结合力提高了7.05倍,纳米压痕硬度提高了7.11倍;在室温潮湿大气条件下,MoS2/Ti/C复合薄膜比Mos2薄膜具有更低的摩擦系数和更优异的耐磨性能,平均摩擦系数为0.103,磨损率为9.67×10(-7)mm3/(N·m).
参考文献
[1] | Spalvins T .A review of recent advances in solid film lubrication[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1987,A5:212-219. |
[2] | 王均安;于德洋;欧阳锦林 .二硫化钼溅射膜在潮湿空气中贮存后润滑性能的退化与失效机理[J].摩擦学学报,1994,14(01):25-32. |
[3] | Simmonds M C;Savan A;Pfltiger E et al.Mechanical and tribological performance of MoS2 co-sputtered composites[J].Surface and Coatings Technology,2000,126:15-24. |
[4] | Gangopadhyay, S;Acharya, R;Chattopadhyay, AK;Paul, S .Pulsed DC magnetron sputtered MoSx-TiN composite coating for improved mechanical properties and tribological performance[J].Surface & Coatings Technology,2009(20/21):3297-3305. |
[5] | 周晖,温庆平,郝宏,谭立,王长胜,薛德胜.非平衡磁控溅射沉积MoS2-Ti复合薄膜结构与磨擦摩损性能研究[J].摩擦学学报,2006(02):183-187. |
[6] | Wang D Y;Chang C L;Chen Z Y et al.Microstructural and tribological characterization of MoS2-Ti composite solid lubricating films[J].Surface and Coatings Technology,1999,120-121:629-635. |
[7] | Polcar T;Evaristo M;Cavaleiro A .The tribological behavior of W-S-C films in pin-on-disk testing at elevated temperature[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2007(11/12):1439-1442. |
[8] | 周磊,尹桂林,王玉东,余震,何丹农.反应溅射WS2/MoS2/C复合薄膜的摩擦磨损性能[J].中国有色金属学报,2010(03):483-487. |
[9] | Takanori Takeno;Shingo Abe;Koshi Adachi .Deposition and structural analyses of molybdenum-disulfide (MoS2)-amorphous hydrogenated carbon (a-C:H) composite coatings[J].Diamond and Related Materials,2010(5/6):548-552. |
[10] | G. L. Yin;P. H. Huang;Z. Yu;D. N. He;J. P. Tu .Microstructure, chemical and tribological investigations of Mo{sub}xW{sub}(1-x)S{sub}y co-sputtered composite films[J].Tribology letters,2006(1):37-43. |
[11] | Lince J R;Fleischauer P D.Crystallinity of rf-sputtered MOS2 films[J].Journal of Materials Research,1987(02):827-838. |
[12] | Fleischauer P D .Fundamental aspects of the electronic structure,materials properties and lubrication performance of sputtered MoS2 films[J].THIN SOLID FILMS,1987,154:309-322. |
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