通过在空气中退火来改善由磁控溅射方法制备的LaNi5合金膜的表面结构,使其具有在室温下吸放氢的能力.借助原子力显微镜、X射线衍射和X射线光电子能谱,分析了LaNi5合金膜退火前后的形貌,结构和表层成分.结果表明:在空气中退火后,LaNi5合金膜比表面积增加,并在其表层形成了La2O3-Ni的表层结构.氢敏测试结果显示,在空气中退火的样品不需要在高压纯氢中活化,在室温下即对氢气响应,说明该合金膜可以作为氢气传感器的敏感层.
参考文献
| [1] | T.Miyashitaa,Y.Masudab,Study on the interaction between hydrogen and metals of LaNi5 type hydrogen absorbing alloys by means of DV-X method,Journal of Alloys and Compounds,475,22(2009) |
| [2] | M.Mizuno,H.Araki,Y.Shirai,Effect of hydrogen on stability of vacancy in LaNi5,Journal of Physics,165,012043(2009) |
| [3] | B.Joseph,B.Schiavo,Effects of ball-milling on the hydrogen sorption properties of LaNi5,Journal of Alloys and Compounds,480,912(2009) |
| [4] | S.K.Pandey,A.Srivastava,O.N.Srivastava,Improvement in hydrogen storage capacity in LaNi5 through substitution of Ni by Fe,International Journal of Hydrogen Energy,32,2461(2007) |
| [5] | A.Demircan,M.Demiralp,Y.Kaplan,M.D.Mat,T.N.Veziroglu.Experimental and theoretical analysis of hydrogen absorption in LaNi5-H2 reactors,Int.Journal of Hydrogen Energy,30,437(2005) |
| [6] | B.Devi,A.S.Banthia,I.P.Jain,Effect of hydrogen on the conduction mechanism in LaNi5 thin films,Int Journal of Hydrogen Energy,29,1289(2004) |
| [7] | H.Salmguchi,N.Taniguchi,H.Nagai,K.Niki,G.Adachi,J.Shiokawa,Determination of the hydrogen content in amorphous LaNi5 films using a quartz-crystal mass-monitoring method,Journal of Physical Chemistry,89(25),5550(1985) |
| [8] | H.Sakaguchi,H.Seri,G.Adachi,Preparation of amorphous and crystalline LaNi5.0 thin films using a sputtering method and thermodynamics of hydrogen absorption in these films,Journal of Physical Chemistry,94(13),5313(1990) |
| [9] | F.Ishikawa,H.Tega,I.Yamamoto,M.Yamaguchi,Rela-tionships between the electrical resistivity and the metal hydride phases,J.Alloys and Compounds,231(1-2),182(1995) |
| [10] | HUANG Lei,YAO Weiguo,QI Zhengzhong,Influence of RF sputtering conditions on structure and organization of LaNi5 thin films,Journal of Function Material,26,59(1995)(黄磊,姚伟国,戚震中,溅射条件对LaNi5薄膜结构和组织的影响,功能材料,26,59(1995)) |
| [11] | H.Dhaou,F.Askri,M.B.Salah,A.Jemni,S.B.Nasrallah,J.Lanmlourni.Measurement and modelling of kinetics of hydrogen sorption by LaNi5 and two related pseudobinary compounds,International Journal of Hydrogen Energy,32(5),576(2007) |
| [12] | LV Manqi,YIN Yaode,WU Guichun,WU Pingsen,An approach to the activation process of LaNi5.Acta Metallurgica Sinica,19(1),47(1983)(吕曼琪,银耀德,吴桂春,吴平森,LaNi5活化过程的探讨,金属学报,19(1),47(1983)) |
| [13] | V.Fuster,F.J.Castro,G.Urretavizcaya,Application of pressure programmed absorption and desorption to characterize hydriding and dehydriding kinetics of LaNi5 during activation,J.Alloys and Compounds,446-447,24(2007) |
| [14] | KANG Long,LUO Yongchun,Development of hydrogen storage alloys LaNi5-xA1x,Journal of Gansu University of Technology,22(1),11(1996)(康龙,罗永春,LaNi5-xAlx贮氢合金的研究,甘肃工业大学学报,22(1),11(1996)) |
| [15] | TANG Xiaoning,LIN Peiyan,The Btudy of in-situ conductivity of La-Cu-O catalyst,Rare Earths,13,24(1992)(唐晓宁,林琣琰,La-Cu-O催化剂的原位电导研究,稀土,13,24(1992)) |
| [16] | W.E.Wallace,R.F.Karllcek,Jr,H.Imamura,Mechanism of hydrogen absorption by LaNi5,Journal of Physical Chemistry,83(13),1708(1979) |
| [17] | L.Huang,H.Gong,W.Gao,Phase change of sputtered LaNi5 thin films due to hydrogenation,Thin Solid Films,339,78(1999) |
| [18] | TAO Mingda,CHEN Yungui,YAN Kangping,ZHOU Chuan,WU Chaoling,TU Mingjing,Effect of rare earth oxides on the electrochemical performance of hydrogen storage electrode,Rare Metal Materials and Engineering,34(4),552(2005)(陶明大,陈云贵,闫康平,周川,吴朝玲,涂铭旌,稀土氧化物对贮氢合金电极电化学性能的影响,稀有金属材料与工程,34(4),552(2005)) |
| [19] | H.C.Siegmann,L.Schlapbach,C.R.Brundle,Self-restoring of the active surface in the hydrogen sponge LaNi5,Physical Review Letters,40(14),972(1978) |
| [20] | KANG Long,LUO Yongchun,The study of thermodynamics test equipment and test methods of hydrogen storage alloy,Journal of Gainu University of Technology,21(1),1(1995)(康龙,罗永春,贮氢合金热力学测试装置及测试方法的研究,甘肃工业大学学报,21(1),1(1995)) |
| [21] | HUANG Lei,YAO Weiguo,QI Zhenzhong,The study of hydrogen absorption properties of LaNi5 thin films by RF sputtered,Chinese Science Bulletin,39(15),1365(1994)(黄磊,姚伟国,戚震中,射频溅射LaNi5薄膜的吸氢性能研究,科学通报,39(15),1365(1994)) |
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