用射频溅射法系统研究了非晶态CoFeNiNbSiB软磁薄膜的制备工艺,发现在0.5Pa的低氩气压下,可以得到性能优良的软磁薄膜,而且膜的性能受衬底偏压影响很小.经旋转磁场退火热处理后,膜的起始磁导率一直到10MHz都可在3000以上,表现出良好的频率特性.用电阻法研究了非晶膜在退火过程中的结构变化过程,发现高温下非晶膜明显经历了四个连续的阶段。
The preparing processes of amorphous CoFeNiNbSiB soft magnetic thin films using r. f. sputtering have been investigated systematically. It was found that high quality soft magnetic films can be obtained at low pressure Ar(0.5 Pa), and the properties of films are less influenced by the bias. After annealing in a rotating field, the initial permeability of films is not less than 3000, at the field up to 10 MHz, and they show a good frequency response! The structural relaxation process of amorphous films during annealing has been studied by means of resistance monitoring method. Four successive relaxation stages have been observed at high temperature.
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| [8] | Shimada Y, Hasegawa T, Kojima H. IEEE Trans Magn, 1981 |
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