采用射频磁控溅射技术,用六角氮化硼和石墨为溅射靶,以氩气(Ar)和氮气(N2)为工作气体,在玻璃衬底上制备出硼碳氮(BCN)薄膜.通过改变氮气分压比、衬底温度及沉积时间,研究了沉积参量对薄膜光透过性质的影响.利用X射线光电子能谱(XPS)、原子力显微镜(AFM)及可见-近红外透过光谱对薄膜进行了表征.实验结果表明,所制备薄膜在400～1000nm波段具有较高透过率.并且沉积参量对BCN薄膜的透过性能有很大影响,适当改变沉积参量能获得透过率高于90%的BCN薄膜.在固定其它条件只改变一个沉积参量的情况下,得到制备具有较高透过率的BCN薄膜的最佳沉积条件:氮气分压比为1/3、沉积温度为300℃、沉积时间为1h.
参考文献
| [1] | Liu A Y;Wentzcovitch R M;Cohen M L .[J].Physical Review B,1989,39(03):1760-1765. |
| [2] | Kurmaev E Z;Ezhov A V;Shamin S N et al.[J].Journal of Alloys and Compounds,1997,248:86-89. |
| [3] | Jie Yu;E. G. Wang .Turbostratic boron carbonitride film and its field-emitting behavior[J].Applied physics letters,1999(20):2948-2950. |
| [4] | Ahn H.;Wohle J.;Rie KT.;Alberts L. .Transparent BCN coatings by RF PACVD at low temperature using metallo-organic precursors[J].Surface & Coatings Technology,2001(0):894-898. |
| [5] | Ling H;Wu J D;Sun J et al.[J].Diamond and Related Materials,2002,11:1623-1628. |
| [6] | Dong H K;Eungsun B;Sunghun L et al.[J].Thin Solid Films,2004,447-448:192-196. |
| [7] | Gago R;Jiménez I;Albella J M .[J].Thin Solid Films,2000,373:277-281. |
| [8] | Ulrich S;Ehrhardt H;Theel T et al.[J].Diamond and Related Materials,1998,7:839-844. |
| [9] | Caretti I;Jiménez I;Albella J M .[J].Diamond and Related Materials,2003,12:1079-1083. |
| [10] | Liu LH;Wang YX;Feng KC;Li YG;Li WQ;Zhao CH;Zhao YN .Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(12):4185-4189. |
| [11] | 王玉新,冯克成,李英爱,李卫青,刘丽华,赵春红,赵永年.BCxN薄膜的紫外透过光谱研究[J].光谱学与光谱分析,2006(01):102-105. |
| [12] | 王玉新,冯克成,张先徽,王兴权,赵永年.射频磁控溅射制备硼碳氮薄膜[J].功能材料,2007(06):889-890,894. |
| [13] | 王玉新,郑亚茹,冯克成.硼碳氮薄膜的制备及其光透过性质研究[J].辽宁师范大学学报（自然科学版）,2007(03):304-306. |
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