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采用相同的基底偏压和靶基距离,以N2流量和靶材溅射功率为变量,以热作模具用钢H13和Si片为基底,用直流磁控溅射的方法沉积了CrN和CrAlN膜层.对这2种膜层用SEM测其表面形貌,用X射线衍射测其膜层结构,用M-400-H1测其表面显微硬度,用WS-97划痕仪测其膜层/基体之间的结合强度,用UMT-2摩擦磨损试验机测其表面摩擦磨损性能.在分析溅射变量对2种膜层的影响趋势的同时,也分析了Al元素加入后所获得的CrAlN与CrN在结构、力学性能(硬度和膜/基粘结强度)和摩擦性能上的变化趋势.

参考文献

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