利用反应磁控溅射方法，设计并制备了调制周期相同而调制比的TiN/TaN多层膜。利用X射线衍射仪、高分辨透射电子显微镜和纳米压痕仪对多层膜的结构、微观状态和力学性能进行乐系统表征。结果表明：调制结构不仅改变多层膜的生长速率，而且能导致多层膜择优生长取向的变化；界面应力的存在使得薄膜生长速率随沉积层厚度的增加而下降；结构分析发现：在TiN/TaN多层膜中存在着独立外延生长的(111)和(100)两种取向的调制结构，这两种调制结构的调制周期存在着一定的差异；在我们的实验条件下，调制周期为6 nm左右的TiN/TaN多层膜，其硬度提高约50%；在调制比为3:1时，硬度最大值为34.2GPa，弹性模量为344.9GPa；此外，我们根据结构和力学性能的分析结果，讨论了TiN/TaN多层膜的超硬机制。
TiN/TaN multilayers with same period and different modulation ratios have been fabricated using reactive magnetron sputtering methods. X-ray diffraction and high-resolution transmission electron microscopy were used to determine the structural characterization of the multilayers and their mechanical properties were measured by a nanoindentation method. The results show that modulation structure affects both the growth rate and preferred growth direction. With the increase of layer thickness (TiN or TaN), the growth rate of the layer decreases. We also find that two kinds of grains with (111) and (100) normal to the films grow epitaxtially with slightly different modulation periods. The hardness and moduli of TiN/TaN multilayers increase by about 50% and 30%, respectively. The maximum values appear at the modulation ratio of 3:1, hardness is 34.2 GPa and modulus is 344.9 GPa. Based on the structure analysis and the mechanical properties, the hardening mechanism in TiN/TaN multilayers are discussed in the paper.
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| [3] | |
| [4] | |
| [5] |
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