金刚石膜的抛光技术目前已成为影响金刚石膜推广应用的关键技术之一.近年来开发的各种金刚石膜抛光技术都有其各自的优缺点和局限性.基于碳原子扩散的金刚石膜热化学抛光技术因抛光质量好、效率较高、机械损伤小等优点,而具有发展前景.但目前开发的将抛光盘整体加热至高温的热化学抛光方法,存在设备运行复杂、抛光加工成本高等问题.本文综合论述了金刚石膜热化学抛光技术的发展、特点及不同因素对金刚石膜热化学抛光的影响,在此基础上提出了一种稀土金属辅助作用下的金刚石膜超高速抛光新方法.运用扩散理论分析了抛光温度对金刚石膜理论去除率的影响,所得结果与实验较符合.本文提出的超高速抛光方法具有设备简单、可用于金刚石膜的精密抛光等优点.
The polishing technology of diamond films has become one of the key technologies for the popularization and application of diamond films. In recent years, a number of alternative polishing techniques of diamond films have been reported, and each having technological advantages and disadvantages. The thermochemical polishing technology based on the diffusion of carbon atoms has good prospect due to its superior properties, e.g. excellent polishing quality, high efficiency and very small mechanical damage. But up to now, the thermochemiacal polishing method, in which the polishing plate is heated to high temperature, either need complicated apparatus or the polishing process is very costly. In this paper, the development and characteristics of thermochemical polishing techniques were reviewed, and the effects of different factors on thermochemical polishing of diamond films were also reviewed. Finally, a new super-high speed polishing method of diamond films has been proposed, which was aided by the rare earth metal. The effects of polishing temperature on the theoretical removal rate of diamond films has been analyzed by using diffusion mechanics, and the results agree well with the experiment data. The super-high speed polishing method has the advantages of simple apparatus and precision polishing for diamond films, etc.
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