通过测定阴极极化曲线和循环伏安曲线,研究了焦磷酸盐溶液体系在铜电极上电沉积白铜锡的电化学行为,并分析了不同添加剂对电沉积白铜锡阴极过程和电沉积层晶相结构的影响。结果表明,焦磷酸盐溶液体系电沉积白铜锡为不可逆电极过程,溶液中Cu2+与Sn2+也有互相促进电沉积的作用。添加剂IEP、DPTHE和JZ-1都会影响溶液中Cu2+和Sn2+离子还原的阴极极化和电沉积白铜锡的晶相结构。IEP和JZ-1都具有增强Sn2+还原的阴极极化和降低 Cu2+还原的阴极极化的双重作用。无添加剂和添加IEP或DPTHE的镀液中电沉积所得白铜锡的晶相结构都为Cu6Sn5,添加JZ-1的镀液中电沉积所得白铜锡的主要晶相结构则为Cu41Sn11。
The electrochemical behavior of white copper–tin electrodeposition on copper electrode from aqueous pyrophosphate bath was studied by cathodic polarization curve measurement and cyclic voltammetry. The effects of different additives on white copper–tin electrodeposition and crystal structure of the deposit were analyzed. The results showed that the electrodeposition of white copper–tin is an irreversible electrode process. Cu2+and Sn2+ in the solution promotes the electrodeposition of each other. All of the additive IEP, DPTHE and JZ-1 affect the cathodic polarization of Cu2+and Sn2+reduction and the crystal structure of white copper–tin alloy deposit. Both IEP and JZ-1 have a dual function of strengthening the cathodic polarization of Sn2+ reduction and weakening the cathodic polarization of Cu2+reduction. The crystal structure of white copper–tin alloy is Cu6Sn5 by electrodeposition from the baths without additive and with IEP or DPTHE, but is Cu41Sn11 from the bath with JZ-1.
参考文献
[1] | 姜腾达,曾振欧,徐金来,赵国鹏.焦磷酸盐溶液体系电镀白铜锡工艺[J].电镀与涂饰,2011(01):1-5. |
[2] | 曾振欧,赵洋,姜腾达,谢金平,李树泉.无氰电镀白铜锡工艺与镀层性能[J].电镀与涂饰,2012(06):4-8. |
[3] | 张树霞 .焦磷酸盐电镀铜锡合金电极过程[J].北京化工学院学报(自然科学版),1988,15(04):91-99. |
[4] | 冯绍彬,刘清,包祥.焦磷酸盐镀铜锡合金稳定性的研究[J].材料保护,2006(05):23-25. |
[5] | 黄新,余祖孝.焦磷酸盐电镀Cu-Sn合金添加剂研究[J].腐蚀与防护,2011(12):1009-1012. |
[6] | Finazzi GA;de Oliveira EM;Carlos IA .Development of a sorbitol alkaline Cu-Sn plating bath and chemical, physical and morphological characterization of Cu-Sn films[J].Surface & Coatings Technology,2004(2/3):377-387. |
[7] | 刘建平.无氰电镀高锡铜锡合金工艺[J].电镀与涂饰,2008(03):9-11. |
[8] | 张琪,曾振欧,徐金来,赵国鹏.低锡铜-锡合金无氰电镀工艺[J].电镀与涂饰,2011(09):1-4. |
[9] | 何建平.无氰电镀工艺的研究现状及解决问题的途径[J].电镀与涂饰,2005(07):42-45. |
[10] | 钟云,何永福,贺飞,刘利梅,苏永庆.电镀铜锡合金工艺研究进展[J].电镀与环保,2007(04):1-3. |
[11] | Jung S.W.;Jung J.P.;Zhou Y. .Characteristics of Sn–Cu Solder Bump Formed by Electroplating for Flip Chip[J].IEEE transactions on electronics packaging manufacturing: A publication of the IEEE Components, Packaging, and Manufacturing Technology Society,2006(1):10-16. |
[12] | 袁国伟,谢素玲.铜锡合金代镍电镀工艺的研究进展[J].电镀与环保,2002(04):1-4. |
[13] | 赵洋,曾振欧,谢金平,范小玲,高帅.添加剂对无氰电镀白铜锡工艺的影响[J].电镀与涂饰,2013(02):1-5. |
- 下载量()
- 访问量()
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%