MOD法在种子层/Ni-W上制备La0.4Sr0.6TiO3薄膜的研究

功能材料, 2011, 42(1): 40-46.

MOD法在种子层/Ni-W上制备La0.4Sr0.6TiO3薄膜的研究

罗清威 ^1, , 王雪 ^2, , 李风华 ^3, , 冉阿倩 ^4, , 李英楠 ^5, , 樊占国 ^6,

1.东北大学材料与冶金学院,辽宁沈阳,110819

2.东北大学材料与冶金学院,辽宁沈阳,110819

3.东北大学材料与冶金学院,辽宁沈阳,110819

4.东北大学材料与冶金学院,辽宁沈阳,110819

5.东北大学材料与冶金学院,辽宁沈阳,110819

6.东北大学材料与冶金学院,辽宁沈阳,110819

基金项目: 东北大学基本科研业务费资助项目(N100602010) 东北大学博士研究生创新资助项目(90602008) 国家高技术研究发展计划(863计划)资助项目(2008AA03Z202)

关键词： SrTiO3种子层 , La0.4Sr0.6TiO3缓冲层 , 热处理 , 取向

Preparation of La0.4Sr0.6TiOs films on seed layers/Ni-5% W with metal-organic deposition method

采用金属有机沉积法(MOD)在双轴织构的Ni-5%(原子分数)W基带上制备了SrTiO3种子层,然后再在种子层上沉积La0.4Sr0.6TiO3薄膜.SEM图像显示种子层颗粒分布均匀,大小基本一致.通过XRD和SEM研究了不同热处理温度对La0.4Sr0.6TiO3薄膜取向和微观形貌的影响,结果显示,在Ar-4%H2气氛下于950℃制备的薄膜取向良好,表面光滑致密,无裂纹和孔洞出现.

参考文献

[1]	Yurek G .[J].Superconductor Industry,1996,9:12-19.
[2]	wang S S;Qiu L;Wang L et al.[J].Superconductor Science and Technology,2005,18:1271-1274.
[3]	Li G;Zhang W;Schoop U .[J].Physica C:Superconductivity,2001,357-360:980.
[4]	Celik E;Hascicek Y S .[J].Materials Science and Engineering,2002,94(2-3):176-180.
[5]	Ginley Davis S;Bright C .[J].MRS Bulletin,2000,25:15-18.
[6]	Goodenough J B.Metallic Oxides Progress in Solid State Chemistry[M].Oxford:pergamon Press,1971:145-399.
[7]	Cox P A.Transition Metal Oxides[M].Oxford:clarendon Press,1995:57-109.
[8]	Miyahara S;Mila F .[J].Progress of Theoretical Physics Supplement,2002,145:266-271.
[9]	Kim K;Norton DP;Christen DK;Cantoni C;Aytug T;Goyal A .Epitaxial (La, Sr)TiO3 on textured Ni-W as a conductive buffer architecture for high temperature superconducting coated conductor[J].Physica, C. Superconductivity and its applications,2008(13):961-967.
[10]	Zhu XB;Liu SM;Hao HR;Chen L;Song WH;Sun YP;Shi K;Sun ZY;Chen S;Han Z .Preparation of SrTiO3 buffer layers on BaxSr1-xTiO3 seed layers buffered Ni tapes by chemical solution deposition[J].Physica, C. Superconductivity and its applications,2004(3/4):143-147.
[11]	Siegal M P;Clem P G;Dawley J T et al.[J].Applied Physics Letters,2002,80(15):2710-2712.
[12]	Zhu X B;Liu S M;Hao H R et al.[J].Seripta Materialia,2004,51:659-663.
[13]	Srivatsan S;Kamel S .[J].Superconductor Science and Technology,2001,14:643-645.
[14]	徐赛生,曾磊,张立锋,顾晓清,张卫,汪礼康.集成电路Cu互连线的XRD研究[J].半导体技术,2008(11):985-987.
[15]	曲喜新.薄膜物理[M].上海:上海科学技术出版社,1986:34-40.
[16]	吴自勤.薄膜生长[M].北京:科学出版社,2001:122-124.

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

MOD法在种子层/Ni-W上制备La0.4Sr0.6TiO3薄膜的研究

Preparation of La0.4Sr0.6TiOs films on seed layers/Ni-5% W with metal-organic deposition method

参考文献