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    采用扫描电镜(SEM)、能谱仪(EDS)X射线结构衍射仪(XRD)及拉伸实验等方法,研究了铀(U)上磁控溅射Al镀层在480,2小时,60 MPa条件下热等静压(HIP)处理对界面特性以及膜基结合强度的影响.结果表明:经HIP处理后,镀层密度达到了其理论密度;镀层由柱状晶转变为致密的层状结构,在界面处AlU元素形成了互扩散,并生成了金属间化合物UAl2UAl3;膜基结合形成了冶金结合,结合强度有所增强.

     The effect of hot isostatic pressing(HIP)on interface characteristics and adhesion strength of aluminum coating on uranium substrate were investigated by scanning electron microscopy(SEM),energy dispersive spectrometer(EDS),X-ray diffraction(XRD)and tensile tests.The aluminum coating was prepared by magnetron sputtering on uranium and then HIP-treated under 60MPa at 480 for 2 h.The results show that after HIP treatment,the density of the coating reaches its theory value,and the microstructure of which changes from a columnar structure to a lamellar one.Intermetallic compounds UAl3 and UAl2 were grown at the interface due to the interdiffusion of uranium and aluminum,forming a metallurgical bonding between the coating and substrate therefore the adhension strength increases.

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