为探索羟基磷灰石（HA）在含碳基体上电化学沉积，采用了高定向裂解石墨（HOPG）片这一具有原子级平整表面的导电材料作为阴极材料，探索了电沉积时间、溶液pH值及溶液浓度对沉积层成分和形貌的影响，利用TEM、SEM、AFM、EDS及XRD等进行了表征分析，并初步探讨了羟基磷灰石电沉积机理。结果表明电解液初始PH值为5和钙离子浓度低于0．007mol／L时有利于促进HA的生长，并且可以形成单层片状结构，得到比较规整完善的多孔状单层HA涂层。而延长电沉积和陈化时间则有助于缺钙型HA垂直于基底表面生长，并促进钙磷比增加，形成缺钙性HA。研究将为电沉积羟基磷灰石的应用提供必要的理论和实验支持。
In order to explore the electrochemical deposition of hydroxyapatite on carbonic substrate, highly oriented pyrolytic graphite, which possesses a nano-scaled smooth surface, was used as the cathode substrate in the electrophoretic depositon. TEM, SEM, AFM, EDS, and XRD were applied to characterize the coating compo- sition and topography to study the influence of time, solution pH and solution concentration on the HA coating. The results show that it is favorable for the HA growth and obtaining porous monolayer-coating composed of flake-like microstructure when the initial pH is 5 and Ca^2＋ concentration is under 0. 007mol/L. The XRD and EDS show the coating is maked up with Ca-deficient HA. Moreover, with the increasement of the deposition and aging time, the HA coating is more inclined to grow perpendicularly on the suhstrate and has a higher calcium-phosphorus ratio. This research will provide necessary theoretical and experimental support for the electrochemical deposition of hydroxyapatite.
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