采用向溶液添加少量偏钒酸铵的方法在镁基表面制备出了钒掺杂微弧氧化膜,有效调控了膜层的电化学与光学性能.结果表明:膜层中钒的掺杂量约为8.5 at%,部分钒元素形成了V2O3.钒掺杂后膜层的孔隙结构发生变化,厚度与硬度基本保持稳定.极化曲线测试表明,钒掺杂膜层的腐蚀电位显著正移,腐蚀电流明显降低,分别由掺杂前的-1.208 V和0.825×10-3A/cm2变为掺杂后的-0.037 V和0.3837×10-4A/cm2.UV-Vis反射光谱分析发现,钒掺杂后膜层的反射率大幅度降低,且在可见光区此现象尤为显著.
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